This glass reduces deterioration from laser radiation to 1/5 or less relative to that of conventional artificial crystals, and its light resistance against high-intensity lasers, which are used for IC steppers/scanners, etc., has been greatly improved. It is an optimal artificial crystal for polarization optical elements (such as depolarization plates and wave plates), diffractive optical elements, and prism materials.
Synthetic quartz crystal CQ has considerably improved resistance to intense laser beams used in semiconductor lithography equipment, developed in synergy with high-quality quartz crystal manufacturing technology and AGC’s expertise in polishing and laser resistance evaluation. CQ shows deterioration by laser irradiation equal to or less than 1/5 that of conventional synthetic quartz crystal materials.
|Bubbles and inclusions||IEC758/JIS C 6704||Ⅰb|
|CTE (30-100°C)||Z axis||8ppm/K|
|Refractive Index||at 589nm||1.54|
|Degradation of Transmission||/pls x 0.18Mpls||＜0.3％/cm|
|Heat conductivity (200°C)||K(W/m-℃)
- Data is for reference only.
Durability to ArF Irradiation
Conventional Synthetic Quartz Crystal vs. High Laser Durability Crystal CQ (5mJ/cm2/pulse)
△absorption coefficient spectra after ArF irradiation (5mJ/cm2/pulse,1 Billion)